A Material Mask Overlay Strategy for Close to Binary Design-dependent Pressure-loaded Optimized Topologies
share
This paper presents a Material Mask Overlay Strategy topology optimization approach with improved material assignment at the element level for achieving close to black-and-white designs for pressure-loaded problems. Hexagonal elements are employed to parametrize the design domain as this tessellation provides nonsingular local connectivity. Elliptical negative masks are used to find the optimized material layout. The material dilation and material erosion variables of each mask are systematically varied in association with a gray-scale measure constraint to achieve designs close to 0-1. Darcy's law in association with a drainage term is used to formulate the pressure field. The obtained pressure field is converted into the consistent nodal forces using Wachspress shape functions. Sensitivities of the objective and pressure load are evaluated using the adjoint-variable method. The approach is demonstrated by solving various pressure-loaded structures and pressure-actuated compliant mechanisms. Compliance is minimized for loadbearing structures, whereas a multicriteria objective is minimized for mechanism designs.
READ FULL TEXT
